RESIST STRIPPING

RBP Chemical Technology
RESIST STRIPPING

Innerlayer

  • ADF-55 - Formulated to remove fully aqueous
    dry films and liquid resists in soak or spray
    applications.
  • DUAL STRIP BAT - Highly effective resist
    stripping product for any liquid or dry film
    inner layer resist. Strong anti-tarnish package
    to maximize productivity at AOI.
  • ULTRASTRIP BAT - General purpose inner
    layer stripper. Low pH working solution.
    Excellent with flex.

Outerlayer

  • Microstrip™ONE - Aqueous resist stripper
    designed to reduce the most tenacious resists
    to fine particles
  • MICROSTRIP 2000 - High speed resist stripping
    product designed to remove the toughest
    adhering resists by creating very small particles. 
    Ideal for overplate conditions.
  • ADF-25C - A fully aqueous, highly concentrated
    stripper producing high speeds and small
    particles. Ideal for fine lines and spaces.

Dual Purpose

  • ADF-14 BAT - General purpose resist
    stripper for a broad range of photoresists.
  • ADF-30 - Strong, consistent performance
    on a wide variety of photoresists.  Fast strip
    speeds producing filterable particles.

Flex

  • FLEXSTRIP - General purpose resist
    stripper for a broad range of photoresists.

 

RBP Chemical Technology, Inc.
150 S. 118th Street
Milwaukee, WI USA 53214-0069
1-800-558-0747
Outside USA: 1-414-258-0911

© Copyright 2006 RBP Chemical, Inc.
All Rights Reserved.

USA
150 S 118th St.
PO Box 14069
Milwaukee, WI 53214
Phone: 414-258-0911
Fax: 414-258-7908
800-558-0747

Outside USA
+ 1-414-258-0911

RBP Technology (India) Pvt., Ltd.
Neelima Enterprises Compound
N.H. NO. 8 opp Sayali Petrol Pump
Pelhar, Vasai Phata
Vasai (E) District:  Thane  401 208   INDIA
corporate: 91-250-3262040
mobile: 91-9819110182

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